Contact Shadow Mask - Negative
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Description

This is a contact shadow mask for use with a negative photo-resist (PR) during UV-lithography. It is used in micro-fabrication and its customize-able to get different feature shapes and sizes.

From NIH 3D

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Source creator
lwilder
Source license
CC-BY-SA
Archived copies are shared under the license shown.
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Contact Shadow Mask - Negative

From NIH 3D
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Category

learning

License

CC-BY-SA

Published

9/2/2026

Availability

free on NIH 3D